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Wednesday, 12 October, 2011

Optical Force Stamping Lithography

S. Nedev, A. S. Urban, A. A. Lutich, and Jochen Feldmann -
Nano Lett., Vol. 11 (11), pp. 5066-5070 (2011)

Here we introduce a new paradigm of far-field optical lithography, optical force stamping lithography. The approach employs optical forces exerted by a spatially modulated light field on colloidal nanoparticles to rapidly stamp large arbitrary patterns comprised of single nanoparticles onto a substrate with a single-nanoparticle positioning accuracy well beyond the diffraction limit. Because the process is all-optical, the stamping pattern can be changed almost instantly and there is no constraint on the type of nanoparticle or substrates used.


Article on journal's website