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Monday, 23 June, 2014

Atomic-Layer-Deposited Aluminum and Zirconium Oxides for Surface Passivation of TiO2 in High-Efficiency Organic Photovoltaics

M. Vasilopoulou, D. Georgiadou, A. Soultati, N. Boukos, S. Gardelis, L. Palilis, M. Fakis, G. Skoulatakis, S. Kennou, M. Botzakaki, S. Georga, C. Krontiras, F. Auras, D. Fattakhova-Rohlfing, T. Bein, T. Papadopoulos, D. Davazoglou, and P. Argitis -
Adv. Energy Mat., doi: 10.1002/aenm.201400214, published online: 23 June 2014

The reduction in electronic recombination losses by the passivation of surfaces is a key factor enabling high-efficiency solar cells. Here a strategy to passivate surface trap states of TiO2 films used as cathode interlayers in organic photovoltaics (OPVs) through applying alumina (Al2O3) or zirconia ZrO2) insulating nanolayers by thermal atomic layer deposition (ALD) is investigated. The results suggest that the surface traps in TiO2 are oxygen vacancies, which cause undesirable recombination and high electron extraction barrier, reducing the open-circuit voltage and the short-circuit current of the complete OPV device. It is found that the ALD metal oxides enable excellent passivation of the TiO2 surface followed by a downward shift of the conduction band minimum. OPV devices based on different photoactive layers and using the passivated TiO2 electron extraction layers exhibit a significant enhancement of more than 30% in their power conversion efficiencies compared to their reference devices without the insulating metal oxide nanolayers. This is a result of significant suppression of charge recombination and enhanced electron extraction rates at the TiO2/ALD metal oxide/organic interface.


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